PLASMA PROFILING TOFMS

PP-TOFMS-HORIBA Ultra-Fast, Sensitive and High Resolution Depth Profiling technique Ultra-Fast, Sensitive and High Resolution Depth Profiling technique The new Plasma Profiling TOFMS addresses the needs of materials scientists across a wide range of application areas. PP-TOFMS provides fast elemental depth distribution of almost any material. The speed and ease of use of PP-TOFMS aims at reducing the optimization time of growth processes as many research scientists strive to reduce the time from discovery to applications of new materials. The simultaneous full coverage of TOFMS available for each point of depth permits the detection of non suspected contamination. This is key for failure analysis and optimization of thin film processes that tend to no longer be based on ultra-high grade methods (i.e. ink jet printing…). PP-TOFMS will be the ideal close-to-process tool for materials scientists: To check on stoichiometry versus depth of layers ranging from nm to tens of microns To determine doping depth distribution Identify unsuspected contamination Monitor interface composition and width

GD-PROFILER 2™

HORIBA Scientific Pulsed RF Glow Discharge Spectrometers are used in universities where they contribute to the development of new materials with coatings at nano-scale and upward and in industries to monitor photovoltaic devices manufacturing, to understand the origin of corrosion on painted car bodies, to assess the composition of precious metals, to control hard disks or LED manufacturing, to improve Li batteries, etc.